Goldfarb, Dario L.: шукати на сайті Z-Library

Пожертвування 15 вересня 2024 – 1 жовтня 2024 Про збір коштів

Найбільша колекція наукових статей у сіті. 70,000,000+ безкоштовних статей.

Пожертвування 15 вересня 2024 – 1 жовтня 2024

Z-Library - одна з найбільших онлайн-бібліотек у світі, в якій зберігається більше 17,000,000 книг та 84,837,000 статей. Ми намагаємось зробити літературу доступною кожному. Сьогодні (15 вересня 2024) ми відкриваємо додатковий збір пожертвувань на підтримку та розвиток проекту.

Також БЕЗЛІМТНІ завантаження (протягом 31 дня після завершення пожертвування) доступні для ВСІХ користувачів, які підтримають проект в період збору коштів до 1 жовтня 2024.

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond)

Landie, Guillaume, Allen, Robert D., Somervell, Mark H., Xu, Yongan, Burns, Sean, Yoshimoto, Kenji, Burkhardt, Martin, Zhuang, Larry, Petrillo, Karen, Meiring, Jason, Goldfarb, Dario, Glodde, Martin,

Рік:

2011

Мова:

english

Файл:

PDF, 625 KB

english, 2011

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Self-segregating materials for immersion lithography

Henderson, Clifford L., Sanders, Daniel P., Sundberg, Linda K., Brock, Phillip J., Ito, Hiroshi, Truong, Hoa D., Allen, Robert D., McIntyre, Gregory R., Goldfarb, Dario L.

Рік:

2008

Мова:

english

Файл:

PDF, 1.53 MB

english, 2008

3

Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes

Goldfarb, Dario L., Mahorowala, Arpan P., Gallatin, Gregg M., Petrillo, Karen E., Temple, Karen, Angelopoulos, Marie, Rasgon, Stacy, Sawin, Herbert H., Allen, Scott D., Lawson, Margaret C., Kwong, Ran

Журнал:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Рік:

2004

Мова:

english

Файл:

PDF, 931 KB

english, 2004

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Pattern collapse mitigation strategies for EUV lithography

Goldfarb, Dario L., Bruce, Robert L., Bucchignano, James J., Klaus, David P., Guillorn, Michael A., Wu, Chunghsi J., Naulleau, Patrick P., Wood II, Obert R.

Рік:

2012

Мова:

english

Файл:

PDF, 3.57 MB

english, 2012

5

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists

Prabhu, Vivek M., Sturtevant, John L., Wang, Michael X., Jablonski, Erin L., Vogt, Bryan D., Lin, Eric K., Wu, Wen-Li, Goldfarb, Dario L., Angelopoulos, Marie, Ito, Hiroshi

Рік:

2004

Мова:

english

Файл:

PDF, 287 KB

english, 2004

6

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Image collapse issues in photoresist

Simons, John P., Goldfarb, Dario L., Angelopoulos, Marie, Messick, Scott, Moreau, Wayne M., Robinson, Chris, de Pablo, Juan J., Nealey, Paul F., Houlihan, Francis M.

Рік:

2001

Мова:

english

Файл:

PDF, 755 KB

english, 2001

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Fabrication of dual damascene BEOL structures using a multilevel multiple exposure (MLME) scheme, part 2: RIE-based pattern transfer and completion of dual damascene process yielding an electrically functional via chain

Harrer, Stefan, Allen, Robert D., Arnold, John C., Goldfarb, Dario L., Holmes, Steven J., Chen, Rex, Tang, Cherry, Slezak, Mark, Fender, Nicolette, Della Guardia, Ronald A., Joseph, Eric A., Engelmann

Рік:

2010

Мова:

english

Файл:

PDF, 3.91 MB

english, 2010

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Fabrication of dual damascene BEOL structures using a multilevel multiple exposure (MLME) scheme, part 1: lithographic patterning

Goldfarb, Dario L., Allen, Robert D., Harrer, Stefan, Arnold, John C., Holmes, Steven J., Chen, Rex, Tang, Cherry, Fender, Nicolette, Slezak, Mark, Della Guardia, Ronald A., Joseph, Eric A., Engelmann

Рік:

2010

Мова:

english

Файл:

PDF, 5.30 MB

english, 2010

9

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Rinse additives for defect suppression in 193-nm and 248-nm lithogrophy

Skordas, Spyridon, Sturtevant, John L., Burns, Ryan L., Goldfarb, Dario L., Burns, Sean D., Angelopoulos, Marie, Brodsky, Colin J., Lawson, Margaret C., Pillette, Carole J., Bright, Jeffrey J., Isaacs

Рік:

2004

Мова:

english

Файл:

PDF, 915 KB

english, 2004

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Graded spin-on organic bottom antireflective coating for high NA lithography

Henderson, Clifford L., Goldfarb, Dario L., Burns, Sean D., Vyklicky, Libor, Pfeiffer, Dirk, Lisi, Anthony, Petrillo, Karen, Arnold, John, Sanders, Daniel P., Clancy, Aleksandra, Lang, Robert N., Alle

Рік:

2008

Мова:

english

Файл:

PDF, 801 KB

english, 2008

11

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues

Jablonski, Erin L., Sturtevant, John L., Prabhu, Vivek M., Sambasivan, Sharadha, Fischer, Daniel A., Lin, Eric K., Goldfarb, Dario L., Angelopoulos, Marie, Ito, Hiroshi

Рік:

2004

Мова:

english

Файл:

PDF, 935 KB

english, 2004

12

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Chemically amplified resists resolving 25 nm 1:1 line: space features with EUV lithography

Thackeray, James W., Lercel, Michael J., Nassar, Roger A., Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Mackey, Jeff, Naulleau, Patrick, Pierson, Bill, Solak, Harun H.

Рік:

2007

Мова:

english

Файл:

PDF, 1020 KB

english, 2007

13

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Impact of thin resist processes on post-etch LER

Mahorowala, Arpan P., Goldfarb, Dario L., Temple, Karen, Petrillo, Karen E., Pfeiffer, Dirk, Babich, Katherina, Angelopoulos, Marie, Gallatin, Gregg M., Rasgon, Stacy, Sawin, Herbert H., Allen, Scott

Рік:

2003

Мова:

english

Файл:

PDF, 1.29 MB

english, 2003

14

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions

Lin, Qinghuang, Goldfarb, Dario L., Angelopoulos, Marie, Sriram, Suresh R., Moore, Jeffrey S., Houlihan, Francis M.

Рік:

2001

Мова:

english

Файл:

PDF, 578 KB

english, 2001

15

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - High resolution patterning in chemically amplified resists: the effect of film thickness

Medeiros, David R., Moreau, Wayne M., Petrillo, Karen E., Chauhan, Maharshi, Huang, Wu-Song, Magg, Christopher, Goldfarb, Dario L., Angelopoulos, Marie, Nealey, Paul F., Houlihan, Francis M.

Рік:

2001

Мова:

english

Файл:

PDF, 539 KB

english, 2001

16

Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography

Goldfarb, Dario L., Vyklicky, Libor, Burns, Sean D., Petrillo, Karen, Arnold, John, Lisi, Anthony, Pfeiffer, Dirk, Sanders, Daniel D., Allen, Robert D., Medeiros, David R., Owe-Yang, Dah Chung, Noda,

Журнал:

Journal of Photopolymer Science and Technology

Рік:

2008

Файл:

PDF, 884 KB

2008

17

Patterning Material Challenges for Improving EUV Stochastics

Silva, Anuja De, Meli, Luciana, Guo, Jing, Dutta, Ashim, Goldfarb, Dario L., Church, Jennifer, Felix, Nelson M.

Журнал:

Journal of Photopolymer Science and Technology

Рік:

2019

Файл:

PDF, 869 KB

2019

18

Sonoelectrochemistry in Highly Resistive Media:Mass Transport Effects

Frank Marken, Dario L. Goldfarb, Richard G. Compton

Журнал:

Electroanalysis

Рік:

1998

Мова:

english

Файл:

PDF, 107 KB

english, 1998

19

Steady-state voltammetric study of the reduction of decamethylferrocenium in dichloromethane at microelectrodes

Darío L. Goldfarb, Horacio R. Corti

Журнал:

Journal of Electroanalytical Chemistry

Рік:

2001

Мова:

english

Файл:

PDF, 129 KB

english, 2001

20

Formation of deprotected fuzzy blobs in chemically amplified resists

Ronald L. Jones, Tengjiao Hu, Eric K. Lin, Wen-Li Wu, Dario L. Goldfarb, Marie Angelopoulos, Brian C. Trinque, Gerard M. Schmid, Michael D. Stewart, C. Grant Willson

Журнал:

Journal of Polymer Science Part B: Polymer Physics

Рік:

2004

Мова:

english

Файл:

PDF, 196 KB

english, 2004

21

Dielectric and volumetric properties of supercritical carbon dioxide(1)+methanol(2) mixtures at 323.15 K

Dario L. Goldfarb, Diego P. Fernández, Horacio R. Corti

Журнал:

Fluid Phase Equilibria

Рік:

1999

Мова:

english

Файл:

PDF, 149 KB

english, 1999

22

Electrical Conductances of Tetrabutylammonium and Decamethylferrocenium Hexafluorophosphate in Organic Solvents

Darío L. Goldfarb, María Paula Longinotti, Horacio R. Corti

Журнал:

Journal of Solution Chemistry

Рік:

2001

Мова:

english

Файл:

PDF, 93 KB

english, 2001

23

Electrical Conductivity of Decamethylferrocenium Hexafluorophosphate and Tetrabutylammonium Hexafluorophosphate in Supercritical Trifluoromethane

Goldfarb, Darío L., Corti, Horacio R.

Журнал:

Journal of Physical Chemistry B

Рік:

2004

Мова:

english

Файл:

PDF, 128 KB

english, 2004

24

Diffusion of Decamethylferrocene and Decamethylferrocenium Hexafluorophosphate in Supercritical Trifluoromethane

Goldfarb, Darío L., Corti, Horacio R.

Журнал:

Journal of Physical Chemistry B

Рік:

2004

Мова:

english

Файл:

PDF, 128 KB

english, 2004

25

Interfacial Effects on Moisture Absorption in Thin Polymer Films

Vogt, Bryan D., Soles, Christopher L., Jones, Ronald L., Wang, Chia-Ying, Lin, Eric K., Wu, Wen-li, Satija, Sushil K., Goldfarb, Dario L., Angelopoulos, Marie

Журнал:

Рік:

2004

Мова:

english

Файл:

PDF, 98 KB

english, 2004

26

Direct Measurement of the Counterion Distribution within Swollen Polyelectrolyte Films

Prabhu, Vivek M., Vogt, Bryan D., Wu, Wen-li, Douglas, Jack F., Lin, Eric K., Satija, Sushil K., Goldfarb, Dario L., Ito, Hiroshi

Журнал:

Рік:

2005

Мова:

english

Файл:

PDF, 161 KB

english, 2005

27

X-ray Absorption Spectroscopy To Probe Surface Composition and Surface Deprotection in Photoresist Films

Lenhart, Joseph L., Fischer, Daniel A., Sambasivan, Sharadha, Lin, Eric K., Jones, Ronald L., Soles, Christopher L., Wu, Wen-li, Goldfarb, Dario L., Angelopoulos, Marie

Журнал:

Рік:

2005

Мова:

english

Файл:

PDF, 303 KB

english, 2005

28

Electrochemical Characterization of Thin Film Electrodes Toward Developing a DNA Transistor

Harrer, Stefan, Ahmed, Shafaat, Afzali-Ardakani, Ali, Luan, Binquan, Waggoner, Philip S., Shao, Xiaoyan, Peng, Hongbo, Goldfarb, Dario L., Martyna, Glenn J., Rossnagel, Stephen M., Deligianni, Lili, S

Журнал:

Рік:

2010

Мова:

english

Файл:

PDF, 2.60 MB

english, 2010

29

High-Pressure Sonoelectrochemistry in Aqueous Solution: Soft Cavitation under CO 2

Goldfarb, Darío L., Corti, Horacio R., Marken, Frank, Compton, Richard G.

Журнал:

Journal of Physical Chemistry A

Рік:

1998

Мова:

english

Файл:

PDF, 90 KB

english, 1998

30

Structural Volume Changes in Photoinduced Electron Transfer Reactions. Laser-Induced Optoacoustic Studies of Speciation during the Quenching Reaction of Excited Ru(bpy) 32+ by Fe(III) in Aqueous Solutions

Borsarelli, Claudio D., Corti, Horacio, Goldfarb, Dario, Braslavsky, Silvia E.

Журнал:

Journal of Physical Chemistry A

Рік:

1997

Мова:

english

Файл:

PDF, 186 KB

english, 1997

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Focus improvement with NIR absorbing underlayer attenuating substructure reflectivity

Huang, Wu-Song, Goldfarb, Dario, Li, Wai-kin, Glodde, Martin, Noda, Kazumi, Tachibana, Seiichiro, Ohashi, Masaki, Owe-Yang, Dah-Chung, Kinsho, Takeshi, Somervell, Mark H., Wallow, Thomas I.

Рік:

2012

Мова:

english

Файл:

PDF, 553 KB

english, 2012

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - ICE: Ionic contrast enhancement for organic solvent negative tone develop

Wallow, Thomas I., Hohle, Christoph K., Sundberg, Linda K., Wallraff, Gregory M., Bozano, Luisa D., Truong, Hoa D., Sanchez, Martha I., Goldfarb, Dario L., Petrillo, Karen E., Hinsberg, William D.

Рік:

2014

Мова:

english

Файл:

PDF, 771 KB

english, 2014

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Revisit pattern collapse for 14nm node and beyond

Yoshimoto, Kenji, Allen, Robert D., Somervell, Mark H., Higgins, Craig, Raghunathan, Ananthan, Hartley, John G., Goldfarb, Dario L., Kato, Hirokazu, Petrillo, Karen, Colburn, Matthew E., Schefske, Jef

Рік:

2011

Мова:

english

Файл:

PDF, 1.40 MB

english, 2011

34

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 29 September 2015)] Photomask Technology 2015 - Fabrication of a full-size EUV pellicle based on silicon nitride

Hayashi, Naoya, Kasprowicz, Bryan S., Goldfarb, Dario L.

Рік:

2015

Мова:

english

Файл:

PDF, 811 KB

english, 2015

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Thermomechanical behavior of EUV pellicle under dynamic exposure conditions

Panning, Eric M., Goldberg, Kenneth A., Goldfarb, Dario L., Bloomfield, Max O., Colburn, Matthew

Рік:

2016

Мова:

english

Файл:

PDF, 2.24 MB

english, 2016

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool

Panning, Eric M., Goldberg, Kenneth A., Goldfarb, Dario L., Broadbent, William, Wylie, Mark, Felix, Nelson, Corliss, Daniel

Рік:

2016

Мова:

english

Файл:

PDF, 696 KB

english, 2016

37

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Chain conformation in ultrathin polymer films

Jones, Ronald L., Soles, Christopher L., Starr, Francis W., Lin, Eric K., Lenhart, Joseph L., Wu, Wen-li, Goldfarb, Dario L., Angelopoulos, Marie, Fedynyshyn, Theodore H.

Рік:

2002

Мова:

english

Файл:

PDF, 104 KB

english, 2002

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Acid generation efficiency: EUV photons versus photoelectrons

Hohle, Christoph K., Younkin, Todd R., Goldfarb, Dario L., Afzali-Ardakani, Ali, Glodde, Martin

Рік:

2016

Мова:

english

Файл:

PDF, 758 KB

english, 2016

39

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Measurements of water distribution in thin lithographic films

Vogt, Bryan D., Sturtevant, John L., Soles, Christopher L., Prabhu, Vivek M., Jones, Ronald L., Wu, Wen-Li, Lin, Eric K., Goldfarb, Dario L., Angelopoulos, Marie

Рік:

2004

Мова:

english

Файл:

PDF, 132 KB

english, 2004

40

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Interfacial structure of photoresist thin films in developer solutions

Prabhu, Vivek M., Sturtevant, John L., Vogt, Bryan D., Wu, Wen-Li, Douglas, Jack F., Lin, Eric K., Satija, Sushil K., Goldfarb, Dario L., Ito, Hiroshi

Рік:

2005

Мова:

english

Файл:

PDF, 315 KB

english, 2005

41

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications

Chey, S. J., Guarnieri, Charles R., Babich, Katherina, Pope, Keith R., Goldfarb, Dario L., Angelopoulos, Marie, Racette, Kenneth C., Hibbs, Michael S., Gibson, Margaret L., Kimmel, Kurt R., Progler, C

Рік:

2001

Мова:

english

Файл:

PDF, 204 KB

english, 2001

42

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts

Prabhu, Vivek M., Jones, Ronald L., Lin, Eric K., Soles, Christopher L., Wu, Wen-li, Goldfarb, Dario L., Angelopoulos, Marie, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 218 KB

english, 2003

43

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Diffusion-induced line-edge roughness

Stewart, Michael D., Schmid, Gerard M., Goldfarb, Dario L., Angelopoulos, Marie, Willson, C. Grant, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 144 KB

english, 2003

44

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - X-ray absorption spectroscopy to probe interfacial issues in photolithography

Lenhart, Joseph L., Fischer, Daniel A., Sambasivan, Sharadha, Lin, Eric K., Jones, Ronald L., Soles, Christopher L., Wu, Wen-li, Goldfarb, Dario L., Angelopoulos, Marie, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 372 KB

english, 2003

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Source optimization for three-dimensional image designs through film stacks

Melville, David O. S., Levinson, Harry J., Dusa, Mircea V., Rosenbluth, Alan E., Tian, Kehan, Goldfarb, Dario, Harrer, Stefan, Colburn, Matthew

Рік:

2009

Мова:

english

Файл:

PDF, 501 KB

english, 2009

46

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Deprotection volume characteristics and line-edge morphology in chemcially amplified resists

Jones, Ronald L., Hu, Tengjiao, Prabhu, Vivek M., Soles, Christopher L., Lin, Eric K., Wu, Wen-li, Goldfarb, Dario L., Angelopoulos, Marie, Trinque, Brian, Willson, C. Grant, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 479 KB

english, 2003

47

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Enhancement of KRS-XE for 50 keV Advanced Mask Making Applications

Petrillo, Karen E., Medeiros, David R., Bucchignano, Jim, Angelopoulos, Marie, Goldfarb, Dario L., Huang, Wu-Song, Moreau, Wayne M., Lang, Robert, Huang, Chester, Deverich, Christina, Cardinali, Thoma

Рік:

2002

Мова:

english

Файл:

PDF, 1.05 MB

english, 2002

48

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Rinse additives for line-edge roughness control in 193-nm lithography

Goldfarb, Dario L., Sturtevant, John L., Burns, Sean D., Burns, Ryan L., Brodsky, Colin J., Lawson, Margaret C., Angelopoulos, Marie

Рік:

2004

Мова:

english

Файл:

PDF, 722 KB

english, 2004

49

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Polymer dynamics and diffusive properties in ultrathin photoresist films

Soles, Christopher L., Jones, Ronald L., Lenhart, Joseph L., Prabhu, Vivek M., Wu, Wen-li, Lin, Eric K., Goldfarb, Dario L., Angelopoulos, Marie, Fedynyshyn, Theodore H.

Рік:

2003

Мова:

english

Файл:

PDF, 191 KB

english, 2003

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Bridging CD metrology gaps of advanced patterning with assistance of nanomolding

Rana, Narender, Goldfarb, Dario, Starikov, Alexander

Рік:

2012

Мова:

english

Файл:

PDF, 7.66 MB

english, 2012